Title:
リソグラフィ投影装置およびデバイス製造方法
Document Type and Number:
Japanese Patent JP4489783
Kind Code:
B2
Abstract:
A lithographic apparatus wherein a dipole illumination mode used for printing a line pattern, is arranged to provide quadrupole illumination. Radiation emanating from the two additional poles and passing the mask pattern without being affected by diffraction is prevented from reaching the wafer by a radiation blocking aperture disposed in the projection system. Astigmatism aberration due to lens heating associated with the dipole illumination mode is reduced by lens heating associated with the additional poles of the quadrupole illumination mode.
Inventors:
Tell, win, tejibo
De Clark, Johannes, Wilhelms
Wadener, Peter, Hansen
De Clark, Johannes, Wilhelms
Wadener, Peter, Hansen
Application Number:
JP2007009655A
Publication Date:
June 23, 2010
Filing Date:
January 19, 2007
Export Citation:
Assignee:
AS M Netherlands B.V.
International Classes:
H01L21/027; G03F7/20
Domestic Patent References:
| JP10050585A | ||||
| JP2005311020A | ||||
| JP200176993A | ||||
| JP2001185483A |
Foreign References:
| WO2005022614A1 | ||||
| WO2005078774A1 |
Attorney, Agent or Firm:
Yoshiyuki Inaba
Shinji Oga
Toshifumi Onuki
Shinji Oga
Toshifumi Onuki