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Title:
ポジ型レジスト組成物及びそれを用いたパターン形成方法
Document Type and Number:
Japanese Patent JP4512340
Kind Code:
B2
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Inventors:
Kenichiro Sato
Application Number:
JP2003359314A
Publication Date:
July 28, 2010
Filing Date:
October 20, 2003
Export Citation:
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Assignee:
FUJIFILM Corporation
International Classes:
G03F7/039; C08F220/28; H01L21/027
Domestic Patent References:
JP2002062657A
JP2001117232A
JP2000267287A
JP2000347410A
JP2002020424A
JP2003255542A
JP10055069A
JP2000159758A
JP2001330959A
Other References:
高分子の合成と反応(1),日本,共立出版,1992年,93,高分子末端に、カルボン酸などの官能基を導入
Attorney, Agent or Firm:
Takeshi Takamatsu
Kiyozumi Yazawa



 
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