上層膜形成組成物およびフォトレジストパターン形成方法

Title:

上層膜形成組成物およびフォトレジストパターン形成方法

Document Type and Number:

Japanese Patent JP4525454

Kind Code:

B2

More Like This:

WO/1984/002289	COATED MEDIA FOR OPTICAL RECORDING AND ASSOCIATED COATING TECHNIQUES
JP6466650	Method for producing resist composition

Inventors:

Ryosuke Harada
Takashi Chiba
Daiki Nakagawa
Do Kawachi Hiroshi
Tomohiro Utaka

Application Number:

JP2005130556A

Publication Date:

August 18, 2010

Filing Date:

April 27, 2005

Export Citation:

Assignee:

JSR CORPORATION

International Classes:

G03F7/11; G03F7/039; H01L21/027

Domestic Patent References:

Foreign References:

WO2006091523A1

Attorney, Agent or Firm:

Wake Manipulation

Previous Patent: JPS4525453

Next Patent: JPS4525455