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Title:
量子半導体装置およびその作製方法
Document Type and Number:
Japanese Patent JP4583726
Kind Code:
B2
Abstract:

To eliminate degradation factors due to the wetting layer of a quantum well type, to improve light emission efficiency and wavelength multiplex, and to prevent a dark current.

A quantum semiconductor device has a quantum semiconductor structure provided with (a) a thin film crystal layer positioned on a base semiconductor layer and constituted of a material capable of growth in an S-K mode to the base semiconductor layer without constituting a quantum well to the base semiconductor layer and (b) a quantum dot positioned right above the thin film crystal layer and constituting type I energy band discontinuity to the base semiconductor layer. The thin film crystal layer is constituted of a material to be type II energy band discontinuity to the base semiconductor layer or a material having a band gap larger than the base semiconductor layer.

COPYRIGHT: (C)2005,JPO&NCIPI


Inventors:
Yoshiaki Nakata
Application Number:
JP2003146177A
Publication Date:
November 17, 2010
Filing Date:
May 23, 2003
Export Citation:
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Assignee:
富士通株式会社
International Classes:
H01L29/06; H01L31/10; H01S5/343
Domestic Patent References:
JP9270508A
JP2000012961A
JP11330606A
JP2000022130A
JP2002084042A
Attorney, Agent or Firm:
Tadahiko Ito