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Title:
シミュレーション方法およびシミュレーションプログラム
Document Type and Number:
Japanese Patent JP5036450
Kind Code:
B2
Abstract:
A simulation method is configured to simulate a feature profile of a material surface. The simulation method includes using an algorithm of repeating a step of calculating a surface growth rate and a step of skipping the calculation of the surface growth rate. The surface growth rate is calculated in the step of skipping the calculation of the algorithm if the material surface traverses a material interface.

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Inventors:
Naoshi Ichikawa
Naoki Tamaki
Toshiro Takase
Application Number:
JP2007212419A
Publication Date:
September 26, 2012
Filing Date:
August 16, 2007
Export Citation:
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Assignee:
Toshiba Corporation
International Classes:
H01L21/306
Domestic Patent References:
JP2000340476A
JP7176495A
JP10284483A
JP2000232099A
JP4037116A
JP2039271A
Attorney, Agent or Firm:
Masahiko Hinataji



 
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