Title:
修飾炭素質膜
Document Type and Number:
Japanese Patent JP5066768
Kind Code:
B2
Inventors:
Kohei Shiraishi
Kazuo Sugiyama
Nishioka Maki
Wakisaka Shingo
Ryoji Hamaki
Tatsuyuki Nakatani
Keiji Okamoto
Kazuo Sugiyama
Nishioka Maki
Wakisaka Shingo
Ryoji Hamaki
Tatsuyuki Nakatani
Keiji Okamoto
Application Number:
JP2007233022A
Publication Date:
November 07, 2012
Filing Date:
September 07, 2007
Export Citation:
Assignee:
Kinki University
Toyo Advanced Technologies Co., Ltd.
Toyo Advanced Technologies Co., Ltd.
International Classes:
C23C16/27; B32B9/00
Domestic Patent References:
| JP9052707A | ||||
| JP2004288327A |
Foreign References:
| WO2005097673A1 |
Other References:
TAI F.C., et al.,Correlation between ID/IG Ratio from Visible Raman Spectra and sp2/sp3 Ratio from XPS Spectra of Annealed Hydrogenated DLC Film,Mater Trans,2006年 7月20日,Vol.47, No.7 ,Page.1847-1852
Attorney, Agent or Firm:
Maeda patent office
Hiroshi Maeda
Hiroshi Takeuchi
Takahisa Shimada
Yuji Takeuchi
Katsumi Imae
Atsushi Fujita
Kazunari Ninomiya
Tomoo Harada
Iseki Katsumori
Seki Kei
Yasuya Sugiura
Hiroshi Maeda
Hiroshi Takeuchi
Takahisa Shimada
Yuji Takeuchi
Katsumi Imae
Atsushi Fujita
Kazunari Ninomiya
Tomoo Harada
Iseki Katsumori
Seki Kei
Yasuya Sugiura