Title:
フォトレジストコーティング装備及び方法
Document Type and Number:
Japanese Patent JP5208709
Kind Code:
B2
Abstract:
A photoresist-coating apparatus includes a substrate on which a particle-detecting area and an invalid particle-detecting area are defined, a nozzle discharging photoresist to the substrate and moving along a direction, and a particle-detecting sensor controlling on and off of the nozzle in the particle-detecting area according to presence of particles, wherein in the invalid particle-detecting area, the nozzle operates independently from detection of the particle-detecting sensor.
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Inventors:
Jae-Your Park
Application Number:
JP2008318583A
Publication Date:
June 12, 2013
Filing Date:
December 15, 2008
Export Citation:
Assignee:
LG Display Company Limited
International Classes:
H01L21/027; B05C11/00
Domestic Patent References:
| JP2005085773A | ||||
| JP2007078356A | ||||
| JP2007088375A | ||||
| JP2003347190A | ||||
| JP2007090145A | ||||
| JP2007513385A |
Attorney, Agent or Firm:
Michiharu Soga
Hidetoshi Furukawa
Suzuki Kenchi
Kajinami order
Shunichi Ueda
Hidetoshi Furukawa
Suzuki Kenchi
Kajinami order
Shunichi Ueda