Title:
反射防止膜及びその製造方法
Document Type and Number:
Japanese Patent JP5254664
Kind Code:
B2
Abstract:
It is aimed at finding out a surface pattern and physical properties required for an antireflective film having an excellent antireflective property for light, a light transmissivity, and the like, and at providing an antireflective film having such a specific surface pattern and physical properties, and a production method of the antireflective film; and provided for this object, is an antireflective film, obtained by: processing a surface of an aluminum material, by mechanical polishing, chemical polishing and/or electrolytic polishing; subsequently producing a pattern of mold having taper-shaped pores on the surface of the aluminum material, by combining a formation of an anodic oxide coating based on anodic oxidation of the surface of the aluminum material, with etching of the anodic oxide coating; and transferring the pattern of mold onto an antireflective film-forming material; wherein the antireflective film has, on a surface thereof, convexities having an average height between 100nm inclusive and 1,000nm inclusive, or concavities having an average depth between 100nm inclusive and 1,000nm inclusive, and the convexities or concavities are present at an average period between 50nm inclusive and 400nm inclusive, at least in a certain single direction; and wherein the antireflective film has a haze of 15% or less.
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Inventors:
Kazuya Sato
Matsumoto Tsukasa
Hiroshi Watanabe
Rokuhara Jun
Matsumoto Tsukasa
Hiroshi Watanabe
Rokuhara Jun
Application Number:
JP2008138444A
Publication Date:
August 07, 2013
Filing Date:
May 27, 2008
Export Citation:
Assignee:
Dnp Fine Chemicals Co., Ltd.
Nippon Shinkan Co., Ltd.
Nippon Shinkan Co., Ltd.
International Classes:
G02B1/11; B29C33/38; B29C59/02; G02B1/118; B29K33/04; B29L11/00
Foreign References:
| WO2008001847A1 | ||||
| WO2006059686A1 |
Attorney, Agent or Firm:
Tokuaki Takahashi