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Title:
エピタキシャルウェーハの製造装置及び製造方法
Document Type and Number:
Japanese Patent JP5791004
Kind Code:
B2
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Inventors:
Go Arai
Application Number:
JP2012213787A
Publication Date:
October 07, 2015
Filing Date:
September 27, 2012
Export Citation:
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Assignee:
Shin-Etsu Semiconductor Co., Ltd.
International Classes:
H01L21/205; C23C16/24; C23C16/44; C30B25/16; C30B29/06
Domestic Patent References:
JP8115972A
JP2007294942A
JP2010040534A
JP2007201098A
JP2000363U
Attorney, Agent or Firm:
Ryuji Harikawa
Masanori Sugawara



 
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