Title:
コロイダルシリカ化学機械研磨組成物
Document Type and Number:
Japanese Patent JP6462013
Kind Code:
B2
Abstract:
Methods for fabricating a chemical-mechanical polishing composition include growing colloidal silica abrasive particles in a liquid including an aminosilane compound such that the aminosilane compound becomes incorporated in the abrasive particles. A dispersion including such colloidal silica abrasive particles may be further processed to obtain a chemical-mechanical polishing composition including colloidal silica particles having the aminosilane compound incorporated therein.
Inventors:
Stephen Gran Bean
Jeffrey Dirsard
Ernest Shen
Mary Cabanot
Jeffrey Dirsard
Ernest Shen
Mary Cabanot
Application Number:
JP2016575479A
Publication Date:
January 30, 2019
Filing Date:
June 25, 2015
Export Citation:
Assignee:
CABOT MICROELECTRONICS CORPORATION
International Classes:
C09K3/14; B24B37/00; C09G1/02; H01L21/304
Domestic Patent References:
| JP2000204352A | ||||
| JP2010541204A | ||||
| JP2008288398A | ||||
| JP2010241642A | ||||
| JP2009540575A | ||||
| JP2011216581A | ||||
| JP2006520530A | ||||
| JP2009538821A |
Foreign References:
| US20120156874 |
Attorney, Agent or Firm:
Atsushi Aoki
Takashi Ishida
Tetsuji Koga
Atsushi Ebiya
Naori Kota
Satoshi Deno
Kenji Kimura
Takashi Ishida
Tetsuji Koga
Atsushi Ebiya
Naori Kota
Satoshi Deno
Kenji Kimura