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Title:
検査装置
Document Type and Number:
Japanese Patent JP6584946
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide an inspection apparatus which allows for uniform inspection on the whole inspection region of a sample.SOLUTION: An inspection apparatus includes a primary optical system for irradiating a sample on a stage with a primary beam, a detector including a two-dimensional sensor generating an image of a secondary beam generated from the sample by irradiating the sample with the primary beam, and a secondary optical system for introducing the secondary beam to the two-dimensional sensor. The primary optical system includes a laser light source 1701 generating laser light of Gaussian distribution, a homogenizer 1703 performing intensity distribution conversion of the laser light of Gaussian distribution into the laser light of uniform distribution, and a photoelectric surface 1702 generating a primary beam when irradiated with the laser light of uniform distribution.SELECTED DRAWING: Figure 17

Inventors:
Masanori Hatakeyama
Yasushi Toma
Kenji Watanabe
Kenji Terao
Shoji Yoshikawa
Takehide Hayashi
Ryo Tajima
Application Number:
JP2015252534A
Publication Date:
October 02, 2019
Filing Date:
December 24, 2015
Export Citation:
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Assignee:
Ebara Corporation
International Classes:
H01J37/073; G01N23/2251; G01N23/2252; H01J37/20; H01J37/244; H01J37/28; H01J37/29; H01L21/66
Domestic Patent References:
JP2010015877A
JP2012215905A
JP2003511855A
JP6308039A
JP2001021334A
JP10135288A
Attorney, Agent or Firm:
Seiji Ohno
Kobayashi Hideyoshi
Koji Morita
Osamu Tsuda
Matsuno Chihiro
Seiichi Sakitani
Tsukuda Seigen
Hiroshi Nomoto