Title:
ブロックコポリマーの秩序膜中の欠陥を低減させるための方法
Document Type and Number:
Japanese Patent JP6588555
Kind Code:
B2
Abstract:
The present invention relates to a process for reducing the number of defects in an ordered film comprising a block copolymer (BCP). The invention also relates to the compositions used to obtain these ordered films and to the resulting ordered films that can be used in particular as masks in the lithography field.
Inventors:
Chevalier, Xavier
Inuburi, Lavale
Navarro, Christoph
Nicolet, Ceria
Inuburi, Lavale
Navarro, Christoph
Nicolet, Ceria
Application Number:
JP2017537909A
Publication Date:
October 09, 2019
Filing Date:
January 21, 2016
Export Citation:
Assignee:
Arkema France
International Classes:
C08J5/18
Domestic Patent References:
| JP2011518652A | ||||
| JP2008520450A | ||||
| JP2010007070A | ||||
| JP2016028127A | ||||
| JP2016034748A |
Attorney, Agent or Firm:
Sonoda/Kobayashi Patent Business Corporation