Title:
フォトマスクブランクの設計方法
Document Type and Number:
Japanese Patent JP6675156
Kind Code:
B2
Abstract:
A method for designing a photomask blank comprising a transparent substrate and an optical film thereon is provided. The photomask blank is processed into a transmissive photomask having a pattern of optical film such that the film pattern may be transferred when exposure light is transmitted by the photomask. The optical film is selected using a specific reflectance, which is equal to the reflectance divided by the film thickness, as an index.
Inventors:
Kohei Sasamoto
Hero Kaneko
Judge Inazuki
Souichi Fukaya
Hero Kaneko
Judge Inazuki
Souichi Fukaya
Application Number:
JP2015112959A
Publication Date:
April 01, 2020
Filing Date:
June 03, 2015
Export Citation:
Assignee:
Shin-Etsu Chemical Co., Ltd.
International Classes:
G03F1/38
Domestic Patent References:
| JP2013088814A | ||||
| JP2004226593A |
Attorney, Agent or Firm:
Takashi Kojima
Saori Shigematsu
Katsunari Kobayashi
Takeshi Ishikawa
Katsuhiko Masaki
Saori Shigematsu
Katsunari Kobayashi
Takeshi Ishikawa
Katsuhiko Masaki