Title:
メトロロジ方法及び装置
Document Type and Number:
Japanese Patent JP6697560
Kind Code:
B2
Abstract:
A method, involving illuminating at least a first periodic structure of a metrology target with a first radiation beam having a first polarization, illuminating at least a second periodic structure of the metrology target with a second radiation beam having a second different polarization, combining radiation diffracted from the first periodic structure with radiation diffracted from the second periodic structure to cause interference, detecting the combined radiation using a detector, and determining a parameter of interest from the detected combined radiation.
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Inventors:
Yak, Martin, Jacobs, Johann
Den bouff, allie, jeffrey
Martin, Ebert
Den bouff, allie, jeffrey
Martin, Ebert
Application Number:
JP2018532375A
Publication Date:
May 20, 2020
Filing Date:
December 07, 2016
Export Citation:
Assignee:
AS M Netherlands B.V.
International Classes:
G03F7/20; G01B11/00; G01B11/02; H01L21/66
Domestic Patent References:
| JP2006170996A | ||||
| JP5090126A | ||||
| JP57050611A |
Foreign References:
| US20150204664 | ||||
| US20060126074 | ||||
| EP0534759A1 | ||||
| US4577968 | ||||
| US6710876 |
Attorney, Agent or Firm:
Yoshiyuki Inaba
Toshifumi Onuki
Akihiko Eguchi
Kazuhiko Naito
Toshifumi Onuki
Akihiko Eguchi
Kazuhiko Naito