Title:
リソグラフィ装置及びデバイス製造方法
Document Type and Number:
Japanese Patent JP6697563
Kind Code:
B2
Abstract:
A lithographic apparatus is described, the lithographic apparatus comprising: - an illumination system (IL) configured to condition a radiation beam; - a support (SA2) constructed to support a patterning device (MA), the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam (PR); - a projection system (PS) configured to project the patterned radiation beam onto a target portion of a substrate (W), - a stage assembly (SA) comprising: - a substrate table (WT) constructed to hold the substrate; and - a positioning device configured to displace the substrate table relative to the projection system; - a base frame onto which stage assembly and the projection system are mounted; - the base frame comprising a first portion (SABF) configured to support the stage assembly and a second portion (BF2) configured to support the projection system, the first portion and the second portion being connected to each other via a compliant portion (DC) of the base frame.
Inventors:
Butler, hands
De Horn, Cornelius, Adrinus, Lambertus
Jacobs, Franciscus, Matisse
Kagan, Pavel
Star Reveld, Yoroen, Peter
Wikmans, Maurice, Willem, Joseph, Etienne
De Horn, Cornelius, Adrinus, Lambertus
Jacobs, Franciscus, Matisse
Kagan, Pavel
Star Reveld, Yoroen, Peter
Wikmans, Maurice, Willem, Joseph, Etienne
Application Number:
JP2018533777A
Publication Date:
May 20, 2020
Filing Date:
December 07, 2016
Export Citation:
Assignee:
AS M Netherlands B.V.
International Classes:
G03F7/20; H01L21/683
Domestic Patent References:
| JP2014086524A | ||||
| JP2012097786A | ||||
| JP2005183710A | ||||
| JP2001091681A | ||||
| JP2004221251A | ||||
| JP2006344969A | ||||
| JP2012060117A |
Attorney, Agent or Firm:
Yoshiyuki Inaba
Toshifumi Onuki
Akihiko Eguchi
Kazuhiko Naito
Toshifumi Onuki
Akihiko Eguchi
Kazuhiko Naito