Title:
リソグラフィ方法及び装置
Document Type and Number:
Japanese Patent JP6854914
Kind Code:
B2
Abstract:
A method of reducing an aberration arising during operation of a lithographic apparatus, the method comprising measuring the aberration to obtain an aberration signal, the aberration signal comprising a first component and a second component, wherein the first component of the aberration signal comprises a first frequency band and the second component of the aberration signal comprises a second frequency band, wherein the first frequency band comprises frequencies that are higher than frequencies comprised in the second frequency band, calculating a correction, wherein a first part of the correction is calculated based on the first component of the aberration signal, and applying the correction to the lithographic apparatus.
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Inventors:
Kant Nick
Van Harpen, Robertas, Martinus, Alphonsus
Bex, mark, lawrence
Swanen, Lens, Hendrick-Yan, Maria
Van Ruth, Nico
Downs, James, Robert
Van Harpen, Robertas, Martinus, Alphonsus
Bex, mark, lawrence
Swanen, Lens, Hendrick-Yan, Maria
Van Ruth, Nico
Downs, James, Robert
Application Number:
JP2019552914A
Publication Date:
April 07, 2021
Filing Date:
March 06, 2018
Export Citation:
Assignee:
AS M Netherlands B.V.
International Classes:
G03F7/20
Domestic Patent References:
| JP2016509691A | ||||
| JP2002015997A | ||||
| JP2015062256A |
Foreign References:
| WO2016087388A1 |
Attorney, Agent or Firm:
Yoshiyuki Inaba
Toshifumi Onuki
Akihiko Eguchi
Kazuhiko Naito
Toshifumi Onuki
Akihiko Eguchi
Kazuhiko Naito