Title:
環状シロキサン化合物、その製造方法、それを用いてなる電気絶縁膜の製造法及び膜
Document Type and Number:
Japanese Patent JP6862049
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a cyclic siloxane compound which has a high vapor pressure and an excellent vaporization property, exhibits a high deposition rate by the PECVD method, and is liquid at room temperature.SOLUTION: The cyclic siloxane compound is represented by general formula (1). (Rrepresents a C3-5 alkyl group; Rand Rmay each independently represent a C1-3 alkyl group, and may together form a C3-6 alkylene group; and n, m and o are each independently 1 or 2 and satisfy n+m+o=4.)SELECTED DRAWING: None
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Inventors:
Ryoji Tanaka
Nunokawa Marina
Yuki Yamamoto
Yasushi Furukawa
Yoichi Chiba
Nunokawa Marina
Yuki Yamamoto
Yasushi Furukawa
Yoichi Chiba
Application Number:
JP2017070925A
Publication Date:
April 21, 2021
Filing Date:
March 31, 2017
Export Citation:
Assignee:
Tosoh Corporation
Sagami Central Chemical Research Institute
Sagami Central Chemical Research Institute
International Classes:
C07F7/21; C23C16/18; H01L21/312; H01L21/768; H01L23/532
Domestic Patent References:
JP2007096237A | ||||
JP2005336391A | ||||
JP2005051192A | ||||
JP2015111712A |
Foreign References:
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US20070077778 | ||||
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