Title:
レジストの品質管理方法及びレジストの品質予測モデルを得る方法
Document Type and Number:
Japanese Patent JP6871839
Kind Code:
B2
Abstract:
An object of the invention is to provide a simple, mechanized analytical approach for resist quality control and early source investigation when a defect occurs. A resist quality control method includes the steps of: (1) pretreating a resist to obtain an analysis sample; (2) subjecting the analysis sample to an instrumental analysis to obtain an analysis result; (3) converting the analysis result into numerical data, followed by a multivariate analysis; and (4) performing a quality control based on an analytical result thus obtained.
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Inventors:
Naoki Arai
Justice
Kazuhiro Katayama
Justice
Kazuhiro Katayama
Application Number:
JP2017210782A
Publication Date:
May 12, 2021
Filing Date:
October 31, 2017
Export Citation:
Assignee:
Shin-Etsu Chemical Co., Ltd.
International Classes:
G01N33/44; G01N24/00; G03F7/039; G03F7/20; G03F7/26
Domestic Patent References:
| JP4164251A | ||||
| JP2010538273A | ||||
| JP2014066650A | ||||
| JP9022115A | ||||
| JP2004043777A |
Attorney, Agent or Firm:
Mikio Yoshimiya
Toshihiro Kobayashi
Toshihiro Kobayashi