Title:
研磨液組成物
Document Type and Number:
Japanese Patent JP6910940
Kind Code:
B2
Abstract:
To provide a polishing liquid composition for a magnetic disk substrate that can reduce scratches on a substrate surface after polishing, while ensuring or improving a polishing rate in finish polishing.SOLUTION: An embodiment of the present disclosure relates to a polishing liquid composition for a magnetic disk substrate, used for finish polishing, containing silica particles, a glycerol compound represented by the formula (I), acid, and water. R-X-CH-CH(OH)-CHOH (I). In formula (I), R is a hydrocarbon group having carbon atoms of 1 or more and 10 or less, X is at least one of an oxygen atom and -COO-.SELECTED DRAWING: None
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Inventors:
Tetsushi Yamaguchi
Masato Sugawara
Masato Sugawara
Application Number:
JP2017237087A
Publication Date:
July 28, 2021
Filing Date:
December 11, 2017
Export Citation:
Assignee:
Kao Corporation
International Classes:
C09K3/14; B24B37/00; G11B5/84
Domestic Patent References:
| JP2009155469A | ||||
| JP9314458A | ||||
| JP2001085374A | ||||
| JP201540228A | ||||
| JP11246847A | ||||
| JP9256171A |
Attorney, Agent or Firm:
Patent business corporation Ikeuchi and Partners