Title:
化合物、樹脂、レジスト組成物及びレジストパターンの製造方法
Document Type and Number:
Japanese Patent JP7190968
Kind Code:
B2
Abstract:
To provide a compound, a resin and a resist composition that make it possible to produce a resist pattern with excellent CD uniformity.SOLUTION: The present invention provides a compound represented by formula (I), a resin and a resist composition. [In formula (I), Ris a hydrogen atom or a methyl group. Ris a C1-6 alkyl group. Ris a hydrogen atom or a C1-6 alkyl group. Ar is an optionally substituted C6-36 divalent aromatic hydrocarbon group. Ris an optionally substituted C1-12 fluorinated alkyl group].SELECTED DRAWING: None
Inventors:
Tatsuro Masuyama
Yamamoto Satoshi
Koji Ichikawa
Yamamoto Satoshi
Koji Ichikawa
Application Number:
JP2019102191A
Publication Date:
December 16, 2022
Filing Date:
May 31, 2019
Export Citation:
Assignee:
Sumitomo Chemical Co., Ltd.
International Classes:
C07C69/653; C08F20/12; C08F220/12; G03F7/004; G03F7/039; G03F7/20
Domestic Patent References:
| JP2019099553A | ||||
| JP2013015590A | ||||
| JP2013015572A | ||||
| JP2008052107A |
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation
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