Title:
露光装置および露光方法
Document Type and Number:
Japanese Patent JP7432418
Kind Code:
B2
Abstract:
The objective of the present invention is to smoothly form an inclined line of a pattern in an exposure apparatus. To this end, one embodiment of the present invention is disclosed, wherein the vector data processing circuit (40) in the exposure apparatus (10) converts a vector data of an outline (BD0) into an outline correction vector data (BD+), which has been obtained by shifting the vector data of the outline in the ±X direction (outside the outline and/or inside the outline), and a multiple exposure operation is performed by alternately using the original vector data of the outline (BD0) and the outline correction vector data (BD+).
Inventors:
Takashi Okuyama
Application Number:
JP2020055610A
Publication Date:
February 16, 2024
Filing Date:
March 26, 2020
Export Citation:
Assignee:
Oak Manufacturing Co., Ltd.
International Classes:
G03F7/20
Domestic Patent References:
| JP2018081153A | ||||
| JP2001042544A | ||||
| JP2009290119A | ||||
| JP7240361A |
Foreign References:
| US6425669 | ||||
| US20020171047 |
Attorney, Agent or Firm:
Makoto Kanzaki
Takashi Matsuura
Hiroki Ogura
Takashi Matsuura
Hiroki Ogura