PURPOSE: To obtain the new subject compound having high sensitivity against high energy radiation such as far ultraviolet radiation, electron ray or X-ray, capable of forming patterns by developing with an aqueous alkali solution and useful as a component of a chemical-amplification positive-type resist mate rial suitable for fine processing technique.

CONSTITUTION: This compound is 1,4-bis(diphenylhydroxymethyl)benzene derivative of formula I (X is a tertiary alkyl, an acetal or a silyl; R1 to R4 are each H, an alkyl, an aryl or an alkoxy; R5 to R8 are each H, a halogen, an alkyl, an aryl or an alkoxy), e.g. 1,4-bis[bis(4-t-butoxyphenyl)hydroxymethyl]benzene. The compound of formula I is obtained by reacting a Grignard reagent of a (substituted) benzene compound having a substituting group expressed by OX at 4-position, e.g. 4-t-butoxyphenylmagnesium chloride with dimethyl terephthalate at ≤10°C in a solvent such as tetrahydrofuran. The compound of formula I is useful as a dissolution inhibitor. A compound having a group of formula II is also used as a dissolution inhibitor.