To provide an abrasive material with which a device can be simplified, costs can be lowered and maintenance can be carried out easily, and also the problem of the uneven distribution of abrasive grains and the problem of which the desired degree of the flat cannot be obtained due to the deformation of a pad can be solved without the need of supplying a slurry stably.

This is the abrasive material formed by a CVD method and having the amorphous layer of an inorganic compound of which the surface roughness Ra is in the range of 1-10 μm on the surface, and the abrasive material in which a porous ceramic layer is formed under this amorphous layer.