Title:
ABRASIVE MATERIAL AND POLISHING METHOD
Document Type and Number:
Japanese Patent JPH0724740
Kind Code:
A
Abstract:
PURPOSE: To easily remove abrasive material and buff matter remaining on the surface of a metal workpiece after polished in a water-based washing system using hot water or water rather than chlorinous organic solvent and hydrocarbon aceous organic solvent.
CONSTITUTION: Abrasive material is composed of high hardness particles and medium to retain the particles. The medium to retain the particles contains water-soluble interfacial active agent. In a polishing method, the abrasive material is adhered to a buff to rotate and a metal workpiece is pushed against the buff, and the surface is polished.
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Inventors:
ITO NAOYUKI
Application Number:
JP14418093A
Publication Date:
January 27, 1995
Filing Date:
May 10, 1993
Export Citation:
Assignee:
ITO KUROOMU KK
International Classes:
B24D3/00; (IPC1-7): B24D3/00
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