Title:
引っ込んだ窓を有する研磨パッド
Document Type and Number:
Japanese Patent JP4991294
Kind Code:
B2
Abstract:
The invention provides a polishing pad for chemical-mechanical polishing comprising (a) a first polishing layer comprising a polishing surface and a first aperture having a first length and first width, (b) a second layer comprising a body and a second aperture having a second length and second width, wherein the second layer is substantially coextensive with the first polishing layer and at least one of the first length and first width is smaller than the second length and second width, and (c) a substantially transparent window portion, wherein the transparent window portion is disposed within the second aperture of the second layer so as to be aligned with the first aperture of the first polishing layer and the transparent window portion is separated from the body of the second layer by a gap. The invention further provides a chemical-mechanical polishing apparatus and method of polishing a workpiece.
More Like This:
Inventors:
Turner, Kailua.
Beer, Jeffrey Elle.
Newell, Kelly Jay.
Beer, Jeffrey Elle.
Newell, Kelly Jay.
Application Number:
JP2006526983A
Publication Date:
August 01, 2012
Filing Date:
September 14, 2004
Export Citation:
Assignee:
CABOT MICROELECTRONICS CORPORATION
International Classes:
H01L21/304; B24B37/013; B24B37/20; B24B49/04; B24B49/12; B24D13/14
Domestic Patent References:
| JP200368686A | ||||
| JP2003526938A | ||||
| JP200166217A | ||||
| JP2001179838A | ||||
| JP2561812B2 |
Foreign References:
| WO2002078902A1 |
Attorney, Agent or Firm:
Atsushi Aoki
Takashi Ishida
Tetsuji Koga
Yoshihiro Kobayashi
Satoshi Deno
Nagasaka Tomoyasu
Takashi Ishida
Tetsuji Koga
Yoshihiro Kobayashi
Satoshi Deno
Nagasaka Tomoyasu