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Patent Searching and Data


Title:
ABSOLUTE INTERFERENCE MEASURING METHOD AND LASER INTERFEROMETER DEVICE SUITED THEREFOR
Document Type and Number:
Japanese Patent JPH0749207
Kind Code:
A
Abstract:

PURPOSE: To enhance measuring accuracy by causing a measuring interferometer and a control interferometer to form at least one interference signal each, and calculating the length of a measuring area.

CONSTITUTION: A laser beam source 2 is modulated by a driving power supply within a skip-free wavelength range, and a laser beam source 3 is driven at a certain wavelength. Split beams 6, 7 are detected by respective photodetectors 11, 12. Further, the detectors 11, 12 are connected to a counting electronic circuit and the light sources 2, 3 to laser wavelength control devices. Near the center of a measuring interferometer 4, a control interferometer 13 is also provided, its control area 14 having a certain length shorter than half of the measuring area. Beams of the same beam sources 2, 3 are made to impinge on the interferometers 4, 13 by a beam splitter 15 and a reflector 16. Incidence of the beam on the light source 2 is achieved by a reflector 17. Since standard members are chiefly used, the entire laser interferometer device 1 can be constructed as an integrated optical system.


Inventors:
YURUGEN TEIIRU
DEIITAA MITSUHIERU
ANDOREASU FURANTSU
Application Number:
JP9250294A
Publication Date:
February 21, 1995
Filing Date:
April 28, 1994
Export Citation:
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Assignee:
HEIDENHAIN GMBH DR JOHANNES
FRAUNHOFER GES FORSCHUNG
International Classes:
G01B9/02; (IPC1-7): G01B9/02
Attorney, Agent or Firm:
Mitsufumi Esaki (2 others)