Title:
ADAPTIVE FOCUSING AND TRANSPORT SYSTEM FOR ELECTROPLATING
Document Type and Number:
Japanese Patent JP2023109175
Kind Code:
A
Abstract:
To provide a system and method for plating a workpiece.SOLUTION: In one aspect, an apparatus includes a deposition chamber, a workpiece holder adapted for insertion into and removal from the deposition chamber, a shield with patterns of apertures corresponding to features on the workpiece, a shield holder also adapted for insertion into and removal from the deposition chamber, and a positioning mechanism to position the workpiece in the workpiece holder such that the pattern of apertures on the shield will align with the corresponding features on the workpiece when the workpiece holder and the shield support are inserted into the deposition chamber.SELECTED DRAWING: Figure 8
Inventors:
ARTHUR KEIGLER
DAVID G GUARNACCIA
FREEMAN FISHER
DEMETRIUS PAPAPANAYIOTOU
JONATHAN HAYNES
DANIEL L GOODMAN
DAVID G GUARNACCIA
FREEMAN FISHER
DEMETRIUS PAPAPANAYIOTOU
JONATHAN HAYNES
DANIEL L GOODMAN
Application Number:
JP2023009416A
Publication Date:
August 07, 2023
Filing Date:
January 25, 2023
Export Citation:
Assignee:
ASMPT NEXX INC
International Classes:
H01L21/677; C25D7/12; C25D17/06; C25D17/10; C25D21/00; H01L21/68
Attorney, Agent or Firm:
Yasuhiko Murayama
Shinya Mihiro
Tatsuhiko Abe
Shinya Mihiro
Tatsuhiko Abe