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Title:
ANTI-STAINING SURFACE MATERIAL AND ITS MANUFACTURING METHOD
Document Type and Number:
Japanese Patent JP2005231128
Kind Code:
A
Abstract:

To provide an anti-staining surface material excellent in surface anti-staining properties, reducing the lowering of anti-staining properties caused by rubbing or the like, exhibiting excellent surface hardness and excellent in durability, and its manufacturing method.

The anti-staining surface material is constituted by forming an intermediate layer containing a photopolymerization initiator and a (meth)acrylate on the surface of a base material, curing the same by the irradiation with light, applying a fluorine-containing monomer to the intermediate layer and irradiating the monomer layer with an active energy beam to provide a fluorine-containing polymer film. A cationic polymerizable compound and fine particles are preferably added to the intermediate layer.


Inventors:
KAWAMURA KOICHI
MATSUFUJI AKIHIRO
KANO TAKEYOSHI
Application Number:
JP2004041524A
Publication Date:
September 02, 2005
Filing Date:
February 18, 2004
Export Citation:
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Assignee:
FUJI PHOTO FILM CO LTD
International Classes:
B32B27/30; (IPC1-7): B32B27/30
Attorney, Agent or Firm:
Atsushi Nakajima
Kato Kazunori
Katsuichi Nishimoto
Hiroshi Fukuda