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Title:
ANTIMICROBIAL, ANTIFUNGAL AND ANTISTATIC COMPOSITION AND ANTIMICROBIAL, ANTIFUNGAL AND ANTISTATIC RESIN COMPOSITION
Document Type and Number:
Japanese Patent JP2000344611
Kind Code:
A
Abstract:

To obtain the subject composition excellent in antimicrobial and antifungal properties and further antistatic properties and water, detergent and weather resistances, etc., by including a specific compound, a specified ammonium salt and an organic compound-based antifungal agent.

This composition is obtained by including (A) an ester compound having an ether structure in the molecule, (B) an ammonium salt represented by the formula (any one of R1 to R3 is a 5-24C alkyl and the others are each a 1-5C alkyl; R4 is a 2-4C alkylene; n is 1-15; X is an anion of hydrochloric acid, chloric acid or perchloric acid) as an antimicrobial agent and (C) an organic compound-based antifungal agent. The ingredient A is prepared by carrying out an esterifying reaction of (i) a polyfunctional carboxylic acid with (ii) a monoalkyl ether of glycols. A dichlofluanid-N-haloalkylthio-based compound, a phenol ether derivative, an imidazole derivative, a sulfonyl derivative, etc., are cited as the ingredient C.


Inventors:
HORIOKA MIKIHIKO
MIYAMOTO YASUMITSU
Application Number:
JP15666499A
Publication Date:
December 12, 2000
Filing Date:
June 03, 1999
Export Citation:
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Assignee:
SEKISUI CHEMICAL CO LTD
International Classes:
A01N43/80; A01N25/00; C09K3/16; (IPC1-7): A01N43/80; A01N25/00; C09K3/16