Title:
ANTIMICROBIAL AND LOW-IRRITATION COSMETIC
Document Type and Number:
Japanese Patent JP3630384
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To obtain a cosmetic that has excellent antimicrobial action, shows not only no primary skin irritation and sensitiveness but also gives no unpleasant feeling to skin such piquant, tingling or irritant pain, when it is applied.
SOLUTION: This antimicrobial and low irritation cosmetic contains an extract from Melissa officinalis and one, two or more kinds selected from the group consisting of p-hydroxybenzoic esters, phenoxyethanol, photo-sensitizer No.101 (platonin), photo-sensitizer No.201 (pionin), photo-sensitizer No.401 (luminex), hinokitiol, an N-long chain acyl basic amino acid derivative and its acid adduct and zinc oxide.
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Inventors:
Mori Shuji
Atsuko Imahori
Atsuko Imahori
Application Number:
JP35513296A
Publication Date:
March 16, 2005
Filing Date:
December 20, 1996
Export Citation:
Assignee:
Noevir Co., Ltd.
International Classes:
A61K8/30; A61K8/00; A61K8/33; A61K8/44; A61K8/49; A61K8/96; A61K8/97; A61Q1/00; A61Q1/10; A61Q1/12; A61Q5/02; A61Q19/00; (IPC1-7): A61K7/00; A61K7/48
Domestic Patent References:
| JP6256152A | ||||
| JP6199647A | ||||
| JP5043447A | ||||
| JP4305512A | ||||
| JP6247831A | ||||
| JP2304009A | ||||
| JP8157322A | ||||
| JP7053369A | ||||
| JP9202724A |
Other References:
化粧品ハンドブック,日光ケミカルズ株式会社他,1996年11月 1日,418~426頁
Attorney, Agent or Firm:
Atsuko Ogawa