Title:
低誘電率(Low-k)誘電体に用いる反射防止被覆用組成物
Document Type and Number:
Japanese Patent JP2006509245
Kind Code:
A
Abstract:
Anti-reflective compositions and methods of using those compositions with low dielectric constant materials are provided. In one embodiment, the compositions include polymers comprising recurring monomers having unreacted ring members. In another embodiment, the polymers further comprise recurring monomers comprising ring members reacted with a light attenuating compound so as to open the ring. The compositions can be applied to dielectric layers so as to minimize or prevent reflection during the dual damascene process while simultaneously blocking via or photoresist poisoning which commonly occurs when organic anti-reflective coatings are applied to low dielectric constant layers.
Inventors:
Puri Gadda Lama
Ram James E.
Flame Tony Dee.
Ram James E.
Flame Tony Dee.
Application Number:
JP2004557517A
Publication Date:
March 16, 2006
Filing Date:
December 02, 2003
Export Citation:
Assignee:
Brewer Science INC.
International Classes:
G03F7/11; H01L21/312; B05D3/02; B32B17/10; C08F20/26; C08F20/32; C08F220/28; C08G59/32; C08J7/04; C09D163/00; G03F7/09; H01L21/027; H01L21/311; H01L21/768; H01L23/522; H01L
Attorney, Agent or Firm:
Nozomi Watanabe
Haruko Sanwa
Haruko Sanwa