Title:
反射防止膜形成組成物および反射防止膜
Document Type and Number:
Japanese Patent JP4419554
Kind Code:
B2
More Like This:
| JP3900240 | STYRENE DERIVATIVE |
| JPH10268519 | NOVEL POLYMER AND PHOTORESIST COMPOSITION CONTAINING SAME |
| WO/2021/168422 | FILLER STRUCTURE RETENTION INPOLYMERIC COMPOSITIONS |
Inventors:
Isao Nishimura
Hikaru Sugita
Masato Tanaka
Keiji Konno
Nomura Nakatsutsu
Tsutomu Shimokawa
Hikaru Sugita
Masato Tanaka
Keiji Konno
Nomura Nakatsutsu
Tsutomu Shimokawa
Application Number:
JP2003420621A
Publication Date:
February 24, 2010
Filing Date:
December 18, 2003
Export Citation:
Assignee:
JSR CORPORATION
International Classes:
C08F12/22; G03F7/11; C07C29/147; C07C33/34; C07C67/343; C07C69/76; C09D5/33; C09D125/02
Domestic Patent References:
| JP10048814A | ||||
| JP2002107933A |
Attorney, Agent or Firm:
Toshiaki Fukuzawa