To easily and accurately inspect pattern shapes and foreign matter not on the basis of face-enhanced images such as conventional secondary electron images but on the basis of mass-enhanced reflection electron images on an inspection apparatus and an inspection method for scanning samples by the irradiation of an electron beam, detecting and amplifying reflected reflection electrons, and generating reflection electron images of the samples.
The inspection apparatus is provided with both a means for adjusting the gain and level of reflection electron images on the basis of a reflection electron images of a calibration pattern on a sample or on a sample transfer base to which the sample is fixed and a means for generating reflection electron images of a region to be inspected of the sample on the basis of the gain and the level after adjustment.
TAKAHASHI KATSUYUKI
KOBAYASHI KENICHI
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