To provide an apparatus and a method of processing a substrate by which manufacturing cost can be sufficiently reduced.

A passage switch-over device 500 is controlled to lead a chemical flowing in a piping 211 to a circulation introduction pipe 312 during predispensing of a chemical nozzle 50. The chemical led into the circulation introduction pipe 312 is fed to a circulation piping 120A. The chemical led into the circulation piping 120A is stored once in a recovery tank RTA, and then it is fed to a chemical storage tank TA and is stored therein. The chemical stored in the chemical storage tank TA is fed to the chemical nozzle 50 again during processing of the substrate W by the chemical or predispensing. On the other hand, the passage switch-over device 500 is controlled to lead a cleaning liquid flowing in the piping 211 to a waste introduction piping 313 during nozzle cleaning by the chemical nozzle 50. In this case, the cleaning liquid flowing in the piping 211 is not flown into the circulation piping 120A, but it is fed to the waste piping 130 through the waste introduction piping 313 and it is disposed therefrom.