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Title:
APPARATUS SUITABLE FOR CONTACTING GASES AT HIGH TEMPERATURE
Document Type and Number:
Japanese Patent JP2011136904
Kind Code:
A
Abstract:

To provide an apparatus suitable for contacting gases at high temperature, such as hydrogen with tetrachlorosilane.

A reactor 100 is used for hydrogenating tetrachlorosilane. The reactor 100 has at least one part fabricated from a silicon carbide-based material of construction. The reactor 100 includes: a pressurizable shell 101; a thermal insulator 102 surrounded by the pressurizable shell 101; a heating element 106 surrounded by the thermal insulator 102; and a reaction chamber 107 surrounded by the heating element 106.


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Inventors:
AGRAWAL MANOJ
BAUER DANA
PIPPENGER ROBERT
Application Number:
JP2011075636A
Publication Date:
July 14, 2011
Filing Date:
March 30, 2011
Export Citation:
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Assignee:
HEMLOCK SEMICONDUCTOR CORP
International Classes:
B01J3/00; B01J3/04; C01B33/03; B01J19/00; B01J19/02; B01J19/24; C01B33/107
Domestic Patent References:
JPH06293511A1994-10-21
JPH0356795A1991-03-12
JPH06206718A1994-07-26
JP2003020217A2003-01-24
JPH03288639A1991-12-18
JPH06293511A1994-10-21
JPH0356795A1991-03-12
JPH06206718A1994-07-26
JP2003020217A2003-01-24
JPH03288639A1991-12-18
Attorney, Agent or Firm:
Michiharu Soga
Hidetoshi Furukawa
Suzuki Kenchi
Kajinami order



 
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