Title:
BARRIER FILM WITH TRANSPARENT ELECTRODE
Document Type and Number:
Japanese Patent JP2006113322
Kind Code:
A
Abstract:
To provide a barrier film with a transparent electrode which decreases damages of a barrier layer in a post process such as patterning of the transparent and hardly causes deterioration in the barrier property.
The barrier film is obtained by depositing a barrier layer 2 comprising silicon oxide (SiOx) or silicon nitride (SiNy) or their mixture (SiNnOm) and an acrylic protective layer 3 in order on one surface of a transparent plastic film 17, and depositing an adhesive layer 4, a barrier layer 5 comprising silicon oxide or silicon nitride or their mixture, an acrylic protective layer 6 and a transparent electrode layer 7 in order on the other surface. The acrylic protective layer is formed by acryl flash vapor deposition.
Inventors:
KOMORI TSUNENORI
Application Number:
JP2004301008A
Publication Date:
April 27, 2006
Filing Date:
October 15, 2004
Export Citation:
Assignee:
TOPPAN PRINTING CO LTD
International Classes:
G09F9/30; B32B7/02; B32B9/00; B32B27/30; H01B5/14; H01L27/32; H01L51/50; H05B33/02
Domestic Patent References:
JP2003297556A | 2003-10-17 | |||
JP2003327718A | 2003-11-19 | |||
JP2003191371A | 2003-07-08 | |||
JP2003231198A | 2003-08-19 | |||
JP2000235930A | 2000-08-29 |