Title:
BASE FABRIC FOR PAPER-MAKING, PROVIDED WITH FLAT WARP
Document Type and Number:
Japanese Patent JP3179752
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To obtain a base fabric of low permeability for paper making by weaving MD filaments composed of flat single filaments around CMD filaments composed of single filaments of circular section with a contact tensional region satisfying a specific condition.
SOLUTION: This base fabric, having an average permeability of 90 CFM on the average, preferably in a range from 87 to 93 CFM, is obtained by weaving MD filaments 22 composed of flat polyester single filaments having a thickness (t) around single-layer filament rows 21a, 21b of wefts in the cross machine direction(CMD filaments) composed of polyester single filaments having a diameter of (d) with a contact tensional region CBA kept at a contact arc angle (θ) of at least 60°, preferably 101° and (t) is 0.2 mm, wherein CBA satisfies the relationship CBA > πd(θ/360°)3t.
Inventors:
Henry Jay Lee
Application Number:
JP5251898A
Publication Date:
June 25, 2001
Filing Date:
March 04, 1998
Export Citation:
Assignee:
Asten Johnson Incorporated
International Classes:
D21F1/00; D21F7/08; D21F1/10; (IPC1-7): D21F1/10; D21F7/08
Domestic Patent References:
| JP5777704A | ||||
| JP616390A | ||||
| JP6143300U | ||||
| JP62191898U |
Other References:
【文献】米国特許4438788(US,A)
【文献】国際公開90/304(WO,A1)
【文献】国際公開90/304(WO,A1)
Attorney, Agent or Firm:
Takehiko Suzue (2 outside)
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