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Title:
BASE ISOLATION STRUCTURE
Document Type and Number:
Japanese Patent JP2009052289
Kind Code:
A
Abstract:

To provide a base isolation structure of high reliability exhibiting an excellent base isolating effect on the occurrence of earthquakes in all situations.

The base isolating structure is provided with a ground side foundation formed on the ground on which a building is constructed; a building side foundation formed at the lower part of the building and placed on the ground side foundation; and a friction reducing means provided between the ground side foundation and the building side foundation. The friction reducing means includes a cement-based receiving base laid on the upper face of the ground side foundation, and a cement-based moving plate stuck to the lower face of the building side foundation and laid in face contact on top of the receiving base. The upper face of the receiving base and the lower face of the moving plate which overlap each other are coated with a slip coating film formed by coating a slip coating material using polyimide-based resin as a binder.


Inventors:
KITAGAWA SATOSHI
YAMAMOTO ATSUSHI
SUZUKI KAZUO
KUROYANAGI NOBUYUKI
SADA TAKAHIRO
SAITO KAZUO
HORIE SHOICHI
Application Number:
JP2007220020A
Publication Date:
March 12, 2009
Filing Date:
August 27, 2007
Export Citation:
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Assignee:
PANAHOME CORP
International Classes:
E04H9/02; C10M103/02; C10M103/06; C10M107/38; C10M149/18; E04B1/36; F16F15/02; C10N20/00; C10N20/06; C10N30/06; C10N40/00; C10N50/02
Domestic Patent References:
JP2001165237A2001-06-19
JPH01146042A1989-06-08
JP2007154455A2007-06-21
JP2002061705A2002-02-28
JP2007070859A2007-03-22
JPH03297634A1991-12-27
Attorney, Agent or Firm:
Tadashi Naemura
Sumitomo Shintaro



 
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