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Title:
BASE MATERIAL WITH TRANSPARENT CONDUCTIVE COVERING, ITS MANUFACTURE, AND DISPLAY DEVICE WITH THIS BASE MATERIAL
Document Type and Number:
Japanese Patent JP3302186
Kind Code:
B2
Abstract:

PURPOSE: To improve antireflection performance and electromagnetic shielding effect by forming a transparent covering of low refractive index, after applying specific embrocation for a transparent conductive fine particle layer on a base material and drying it.
CONSTITUTION: Metal fine particles of 2 to 200nm in mean grain size and transparent conductive inorganic oxide fine particles or colored conductive fine particles, as necessary, and matrix formation component are distributed in water and/or organic solvent so that embrocation for metal fine particle layer formation of concentration of 15wt.% or less is obtained. After this embrocation is applied on a base material and dried at ambient temperature-10°C, it is heat- treated at 150°C or more as necessary so that a transparent conductive fine particle layer of 50 to 2000nm in thickness is formed. Transparent covering of 100 to 300nm in thickness is formed on this conductive fine particle layer so that the base material with the transparent conductive covering of surface resistance 102 to 102Ω/square can be obtained.


Inventors:
Hirai Toshiharu
Toshiro Komatsu
Application Number:
JP20897294A
Publication Date:
July 15, 2002
Filing Date:
September 01, 1994
Export Citation:
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Assignee:
Catalyst Kasei Kogyo Co., Ltd.
International Classes:
G02F1/1333; G09F9/30; H01B5/14; H01B13/00; H04N5/65; H05K9/00; (IPC1-7): H01B5/14; G02F1/1333; G09F9/30; H01B13/00; H04N5/65; H05K9/00
Domestic Patent References:
JP5290634A
JP5190089A
JP417398A
JP4323309A
JP334211A
JP3281783A
JP6212125A
JP5190091A
Other References:
【文献】河嶋千尋編,「新しい工業材料の科学 B13.無機顔料」,金原出版,1968年 9月20日,第1版,p.25~37
Attorney, Agent or Firm:
Shunichiro Suzuki