Title:
BLOCK COPOLYMER COMPOUND AND METHOD RELATED THE SAME
Document Type and Number:
Japanese Patent JP2014152331
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a self organization block copolymer consisting of two or more different homopolymers conjugating terminals used for patterning on a base material.SOLUTION: There is provided a block copolymer compound containing a block copolymer blend containing a first poly(acrylic acid ester)-b-poly(silyl acrylic acid ester)block copolymer having a particle average molecular weight of 10 to 1000 kg/mol and degree of dispersion of 1 to 3, and a second poly(acrylic acid ester)-b-poly(silyl acrylic acid ester)block copolymer having a particle average molecular weight of 1 to 1000 kg/mol and degree of dispersion of 1 to 3. The block copolymer compound contains an antioxidant containing at least one kind of 2,6-tert-butylphenol structure of 2 wt.% (based on weight of the block copolymer blend). There is also provided a base material treated by the block copolymer compound.
Inventors:
PHILLIP HUSTAD
PETER TREFONAS
GU XINYU
CHANG SHIH-WEI
GINZBURG VALERIY
VOGEL ERIN
DANIEL MURRAY
PETER TREFONAS
GU XINYU
CHANG SHIH-WEI
GINZBURG VALERIY
VOGEL ERIN
DANIEL MURRAY
Application Number:
JP2014015428A
Publication Date:
August 25, 2014
Filing Date:
January 30, 2014
Export Citation:
Assignee:
ROHM & HAAS ELECT MAT
DOW GLOBAL TECHNOLOGIES LLC
DOW GLOBAL TECHNOLOGIES LLC
International Classes:
C08L53/00; C08F220/18; C08F297/02; C08G83/00; C08K5/13; C08K5/375; C08K5/524; C09D7/12; C09D133/08; C09D153/00
Domestic Patent References:
| JP2004078223A | 2004-03-11 | |||
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| JPH04506679A | 1992-11-19 |
Foreign References:
| WO2011021625A1 | 2011-02-24 |
Other References:
Ｃ．ＢＲＥＳＳＹ ＥＴ ＡＬ．: "Ｐｏｌｙ（ｔｒｉａｌｋｙｌｓｉｌｙｌ ｍｅｔｈａｃｒｙｌａｔｅ）ｓ：Ａ ｆａｍｉｌｙ ｏｆ ｈｙｄｒ", ＰＯＬＹＭＥＲ ＤＥＧＲＡＤＡＴＩＯＮ ＡＮＤ ＳＴＡＢＩＬＩＴＹ, vol. ９５, JPN6017033940, 2010, pages 1260 - 1268, ISSN: 0003772993
Attorney, Agent or Firm:
Patent business corporation センダ international patent firm
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