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Title:
DIRECTED SELF ASSEMBLY COPOLYMER COMPOSITION AND RELATED METHODS
Document Type and Number:
Japanese Patent JP2014152332
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide new copolymer compositions for use in patterning substrates, in particular, new copolymer compositions that enable patterning on intermediate length scales (e.g., 20 to 40 nm) and that preferably exhibit a fast annealing profile with low defect formation.SOLUTION: A copolymer composition is provided including a block copolymer having a poly(styrene) block and a poly(silyl acrylate) block, where the block copolymer exhibits a number average molecular weight (M) of 1 to 1000 kg/mol and a polydispersity (PD) of 1 to 2. The copolymer composition contains 2 wt.% or more of an antioxidant (based on the weight of the copolymer), and the antioxidant includes a 2,6-di-tert-butylphenol structure.

Inventors:
PETER TREFONAS
PHILLIP HUSTAD
GU XINYU
VOGEL ERIN
GINZBURG VALERIY
CHANG SHIH-WEI
DANIEL MURRAY
Application Number:
JP2014015463A
Publication Date:
August 25, 2014
Filing Date:
January 30, 2014
Export Citation:
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Assignee:
ROHM & HAAS ELECT MAT
DOW GLOBAL TECHNOLOGIES LLC
International Classes:
C08L53/00; C08K5/13; H01L21/316
Domestic Patent References:
JP2004213940A2004-07-29
JP2009259796A2009-11-05
JP2004258380A2004-09-16
JP2007266392A2007-10-11
JP2008036491A2008-02-21
JP2010007070A2010-01-14
JP2010138286A2010-06-24
JP2010144120A2010-07-01
Foreign References:
US6258732B12001-07-10
Other References:
MINGU HAN ET AL.: "Homo- and mixed polymer brushes prepared by surface-grafting of asymmetric non-sticky/sticky diblock", REACTIVE & FUNCTIONAL POLYMERS, vol. 73, JPN6017038466, 2013, pages 66 - 72, ISSN: 0003657958
Attorney, Agent or Firm:
Patent business corporation センダ international patent firm



 
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