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Patent Searching and Data


Title:
BONDING METHOD
Document Type and Number:
Japanese Patent JP2011152583
Kind Code:
A
Abstract:

To provide a bonding method capable of improving the bonding reliability of Au-Si eutectic bonding.

In a method for bonding two substrates 1, 2 by Au-Si eutectic bonding, a first substrate 1 formed by using a first silicon substrate 10 and a second substrate 2 formed by using a second silicon substrate 20 are prepared. Under a state that a load is impressed on two substrates 1, 2 superimposed so that an Au membrane 13 of the first substrate 1 and the second silicon substrate 20 of the second substrate 2 are contacted in the chamber of a bonding apparatus; a temperature elevating step for elevating the temperature for two substrates 1, 2 to a specified temperature higher than an Au-Si eutectic temperature, a temperature holding step for holding the heating temperature for two substrates 1, 2 at the specified temperature for a predetermined time, and a temperature lowering step for lowering the temperature for two substrates 1, 2 to room temperature, are successively carried on. In the temperature lowering step, two substrates 1, 2 are rapidly cooled down from the specified temperature.


Inventors:
NISHIJIMA YOICHI
SANAGAWA YOSHIHARU
Application Number:
JP2010017326A
Publication Date:
August 11, 2011
Filing Date:
January 28, 2010
Export Citation:
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Assignee:
PANASONIC ELEC WORKS CO LTD
International Classes:
B23K20/00; B23K20/14; H01L23/02
Attorney, Agent or Firm:
Keisei Nishikawa