BT TREATING METHOD AND APPARATUS - Dainippon Screen Mfg. Co., Ltd.

Title:

BT TREATING METHOD AND APPARATUS

Document Type and Number:

Japanese Patent JP3708200

Kind Code:

B2

Abstract:

PROBLEM TO BE SOLVED: To simplify the BT treatment step to separate movable ions in an oxide film of a semiconductor wafer.
SOLUTION: The surface of a semiconductor wafer is charged with electricity by the corona discharge from an electrifier unit 23, the charged wafer is heated on a heater stage 21 to separate movable Na ions in an oxide film and cooled by a cooling fan 22, and ultraviolet ray generated by flashing a flash tube in a de-electrifier unit 24 is made to irradiate the surface of the cooled wafer to de-electrify it.

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Inventors:

Tatsufumi Kusuda

Application Number:

JP820796A

Publication Date:

October 19, 2005

Filing Date:

January 22, 1996

Export Citation:

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Assignee:

Dainippon Screen Mfg. Co., Ltd.

International Classes:

H01L21/66; G01N27/00; H01L21/02; H01L21/316; H01L21/326; (IPC1-7): H01L21/02; G01N27/00; H01L21/316; H01L21/326; H01L21/66

Domestic Patent References:

JP57177535A
JP54130882A
JP7130809A
JP6053301A
JP8037217A

Attorney, Agent or Firm:

Etsushi Kotani
Tadashi Nagata
Takao Ito
Jiro Higuchi

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