Title:
CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIN, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN
Document Type and Number:
Japanese Patent JP2023171324
Kind Code:
A
Abstract:
To provide a carboxylate and the like and a resist composition which allow a resist pattern having good line edge roughness to be produced.SOLUTION: There are provided: a carboxylate represented by a specific formula and the like; and a resist composition containing the same.SELECTED DRAWING: None
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Inventors:
NOJO WATARU
BAN SAYAKA
ICHIKAWA KOJI
BAN SAYAKA
ICHIKAWA KOJI
Application Number:
JP2023081607A
Publication Date:
December 01, 2023
Filing Date:
May 17, 2023
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
G03F7/004; C07C69/653; C07D303/16; C07D305/06; C09K3/00; G03F7/038; G03F7/039; G03F7/20
Attorney, Agent or Firm:
Patent Attorney Corporation Shinju Global IP