Title:
CARBOXYLATE, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN
Document Type and Number:
Japanese Patent JP2020183376
Kind Code:
A
Abstract:
To provide a carboxylate capable of producing a resist pattern having good CD uniformity (CDU).SOLUTION: A carboxylate is represented by formula (I), [where Z1+ represents an organic cation.]SELECTED DRAWING: None
Inventors:
KOMURO KATSUHIRO
TAKAHASHI YUKI
ICHIKAWA KOJI
TAKAHASHI YUKI
ICHIKAWA KOJI
Application Number:
JP2020074879A
Publication Date:
November 12, 2020
Filing Date:
April 20, 2020
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
C07D319/06; C07C69/80; C07C381/12; C07D321/10; C08F20/12; G03F7/004; G03F7/038; G03F7/039; G03F7/20
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation