To provide a centripetal apparatus and a centripetal method for a wafer capable of obtaining the center of the wafer using two sensors always with accuracy.
A semiconductor wafer 2 ejected from a cassette 1 is conveyed by a conveyer arm 5 to a rotation table 6 along a wafer conveyer path. An edge of the semiconductor wafer 2 is detected by photoelectronic sensors 9 and 10. The center of the semiconductor wafer 2 is obtained based on this edge information. The conveyer arm 5 is controlled so as to put the semiconductor wafer 2 at a reference position of the rotation table 6 in accordance with the obtained information. Whether or not the center of the semiconductor wafer 2 can be obtained from the edge information detected by the photoelectronic sensors 9 and 10 is determined, and if not, the semiconductor wafer 2 is rotated by a predetermined angle, and the semiconductor wafer 2 is set back to the cassette 1 side by the conveyer arm 5, and then conveyed to the rotation table 6 again.
KATO TOMOO
NAKASENDO HISASHI
TSUCHISAKA SHINICHI
| JP2003254738A | 2003-09-10 | |||
| JP2005297072A | 2005-10-27 | |||
| JP2000164680A | 2000-06-16 |
Satoshi Kono
Makoto Nakamura
Kurata Masatoshi
Takashi Mine
Yoshihiro Fukuhara
Sadao Muramatsu
Ryo Hashimoto