CHARGE PARTICLE BEAM MICROSCOPE AND MEASURED IMAGE CORRECTION METHOD USING THE SAME

Title:

CHARGE PARTICLE BEAM MICROSCOPE AND MEASURED IMAGE CORRECTION METHOD USING THE SAME

Document Type and Number:

Japanese Patent JP2012169233

Kind Code:

A

Abstract:

To obtain a charge particle beam microscope which corrects distortion of an image due to an influence of drift of a sample stand so as to reduce distortion of an observation image by measuring a reference image for correction in a shorter time than that for the observation image and correcting a shape of the observation image by comparing with a shape of the reference image for correction without waiting for the moving test stand to stop and with the smaller number of images.

A reference image for correcting distortion is measured at a same potion and a same magnification rate as an image obtained for observation. At the time, for the reference image, the measurement is performed in a shorter than the original time for the observation image so as to reduce an influence of drift. Shapes of the reference image and the observation image are compared and the shape of the observation image is corrected in conformity to the reference image so as to correct the shape of the observation image.

Inventors:

DONG SANG-CHI
SATO NORIO
KOYAMA SHIN

Application Number:

JP2011031516A

Publication Date:

September 06, 2012

Filing Date:

February 17, 2011

Export Citation:

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Assignee:

HITACHI HIGH TECH CORP

International Classes:

H01J37/153; H01J37/22; H01J37/20

Domestic Patent References:

JP2000149853A	2000-05-30
JPH07272665A	1995-10-20
JP2009110734A	2009-05-21
JP2003086126A	2003-03-20
JP2000331637A	2000-11-30
JP2007200784A	2007-08-09

Foreign References:

WO2011007492A1

2011-01-20

Attorney, Agent or Firm:

Manabu Inoue
Yuji Toda
Shigemi Iwasaki

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