CHARGED PARTICLE BEAM DEVICE AND DEVICE MANUFACTURING METHOD USING THE SAME

Title:

CHARGED PARTICLE BEAM DEVICE AND DEVICE MANUFACTURING METHOD USING THE SAME

Document Type and Number:

Japanese Patent JP2002245960

Kind Code:

A

Abstract:

To provide a charged particle beam defect inspecting device and method for correcting a dislocation of a focal position due to a charged-up state of a sample to be observed without troubling an operator, and resultingly ensure a focused clear observation and a precise defect inspection even under a charged-up state of the sample.

A main control system 34 preliminarily prepares and stores in a storage 43 a voltage map showing a defocus level of a multi-beam B1 on a sample surface, according to a charged-up level caused when the sample 10 is irradiated with the primary electron beams B1. When the sample 10 is observed, the main control system 34 reads out the voltage map stored in the storage 43, and controls a voltage applied to an objective lens 8 or a voltage applied to the sample 10 to correct the focal position of the multi-beam B1.

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Inventors:

NISHIMURA HIROSHI
HAMASHIMA MUNEKI
NAKASUJI MAMORU
NOMICHI SHINJI
SATAKE TORU

Application Number:

JP2001042957A

Publication Date:

August 30, 2002

Filing Date:

February 20, 2001

Export Citation:

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Assignee:

NIKON CORP
EBARA CORP

International Classes:

G01N23/225; G01R1/06; G01R31/302; G21K5/04; H01J37/21; H01J37/28; H01J37/29; H01L21/66; G01B15/00; (IPC1-7): H01J37/28; G01B15/00; G01N23/225; G01R1/06; G01R31/302; G21K5/04; H01J37/21; H01J37/29; H01L21/66

Attorney, Agent or Firm:

Kazuo Shamoto (5 outside)

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