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Patent Searching and Data


Title:
CHARGED PARTICLE BEAM EQUIPMENT
Document Type and Number:
Japanese Patent JP2003036808
Kind Code:
A
Abstract:

To make possible to draw the high precision line pattern, increasing degree of freedom in drawing a high precision line pattern, determine a defect and measure a length, not only forming a linear beam to a X-axis and a Y-axis directions, but also forming a linear beam to a certain direction.

It is to collect a charged particle beam ejected from a charged particle source on a sample material by a lens for the charged particle, combine an octpole or a dodecapole structure of the lens with two or more stages, in a electron beam system deflecting and scanning the electron beam disposed to the sample material, and form the linear beam to a direction rotated at a certain angle from the X-axis and XY axis by controlling an exciting condition of each electrode or magnetic pole.


Inventors:
OKAYAMA SHIGEO
Application Number:
JP2001220685A
Publication Date:
February 07, 2003
Filing Date:
July 19, 2001
Export Citation:
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Assignee:
NAT INST OF ADV IND & TECHNOL
International Classes:
G01B15/00; H01J37/12; H01J37/141; H01J37/28; H01J37/317; H01L21/027; (IPC1-7): H01J37/317; G01B15/00; H01J37/12; H01J37/141; H01J37/28; H01L21/027