Title:
CHARGING VESSEL FOR LIQUID CVD MATERIAL, CHARGING VESSEL OF LIQUID CVD MATERIAL AND METHOD OF VAPORIZING AND SUPPLYING USING THEM
Document Type and Number:
Japanese Patent JP2005166771
Kind Code:
A
Abstract:
To provide a means for supplying a liquid CVD material to a semiconductor manufacturing apparatus by efficiently vaporizing the liquid CVD material having a relatively low boiling point at a desired concentration and flow rate without using the apparatus having a complicated constitution.
The charging vessel for the liquid CVD material includes a vaporizing gas exhaust port of the liquid CVD material to fill a solid filler. Further, the charging vessel of the liquid CVD material includes the liquid CVD material in the charging vessel. Furthermore, the liquid CVD material filled in the charge vessel is vaporized by a temperature control, and supplied to the semiconductor manufacturing apparatus.
Inventors:
TAKAMATSU YUKICHI
ASANO AKIYOSHI
ASANO AKIYOSHI
Application Number:
JP2003400971A
Publication Date:
June 23, 2005
Filing Date:
December 01, 2003
Export Citation:
Assignee:
JAPAN PIONICS
International Classes:
C23C16/448; H01L21/205; (IPC1-7): H01L21/205; C23C16/448
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